Semiconductor Industry Alumina Ceramic Robotic Arm

Semiconductor Industry Alumina Ceramic Robotic Arm Puwei's Alumina Ceramic Robotic Arm represents the pinnacle of precision automation components for semiconductor manufacturing. Engineered from high-purity alumina ceramic, this critical component delivers exceptional performance in cleanroom environments where precision, reliability, and contamination control are paramount. Technical Specifications Material Properties Base Material: High-Purity Alumina Ceramic (Al₂O₃) Purity Level: ≥ 99.6% Density: 3.8-3.9 g/cm³ Hardness: ≥ 80 HRA Surface Roughness: Ra ≤ 0.2 μm Performance Characteristics Operating Temperature: -50°C to 1500°C Thermal Expansion Coefficient: 7.2×10⁻⁶/°C Dielectric Strength: 15-20 kV/mm Volume Resistivity: >10¹⁴ Ω·cm Compressive Strength: >2500 MPa Design Specifications Wafer Compatibility: 150mm, 200mm, 300mm Positioning Accuracy: ±0.1 mm Cleanroom Class: Class 1-100 compatible Chemical Resistance: Excellent against acids and alkalis Non-magnetic…

Alumina Ceramic Robotic Arm Alumina Ceramic Structural Components AlN Ceramic Components AlN Ceramic Substrate AlN Ceramic Disc